Title:
SPUTTERING TARGET MEMBER AND METHOD FOR PRODUCING SAME
Document Type and Number:
WIPO Patent Application WO/2019/187311
Kind Code:
A1
Abstract:
Provided is a sputtering target member which is capable of efficiently reducing the generation of particles during the formation of a film. A sputtering target member which is formed from magnesium that has a purity of 99.9% by mass or more, while having an average crystal grain size of 42 μm or less.
Inventors:
KOIDO YOSHIMASA (JP)
Application Number:
PCT/JP2018/042324
Publication Date:
October 03, 2019
Filing Date:
November 15, 2018
Export Citation:
Assignee:
JX NIPPON MINING & METALS CORP (JP)
International Classes:
C23C14/34; C22F1/00; C22F1/06
Domestic Patent References:
WO2011062002A1 | 2011-05-26 | |||
WO2015037533A1 | 2015-03-19 |
Foreign References:
JPH10330928A | 1998-12-15 | |||
JP2001073126A | 2001-03-21 | |||
JP2002348663A | 2002-12-04 | |||
JP2001073126A | 2001-03-21 |
Other References:
See also references of EP 3778984A4
JIS Z 2241: 2011 METALLIC MATERIALS-TENSILE TESTING-METHOD OF TEST AT ROOM TEMPERATURE, 2011
JIS Z 2241: 2011 METALLIC MATERIALS-TENSILE TESTING-METHOD OF TEST AT ROOM TEMPERATURE, 2011
Attorney, Agent or Firm:
AXIS PATENT INTERNATIONAL (JP)
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