Title:
SPUTTERING TARGET MEMBER FOR NON-MAGNETIC LAYER FORMATION
Document Type and Number:
WIPO Patent Application WO/2021/014760
Kind Code:
A1
Abstract:
Provided is a sputtering target member having excellent economy and being useful for the formation of non-magnetic layers have an hcp structure and constituting vertical magnetic recording media. This sputtering target member for non-magnetic layer formation has a structure in which a metal phase and an oxide phase are mutually dispersed. The metal phase contains 20–60 mol% Co, 5–30 mol% Pt, and 1–40 mol% Mo and contains a total concentration of at least 25 mol% Mo, Cr, Ru, and B, relative to the total target member composition. The oxide phase volume ratio is 10%–45%.
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Inventors:
IWABUCHI YASUYUKI (JP)
SHIMOJUKU AKIRA (JP)
SHIMOJUKU AKIRA (JP)
Application Number:
PCT/JP2020/021448
Publication Date:
January 28, 2021
Filing Date:
May 29, 2020
Export Citation:
Assignee:
JX NIPPON MINING & METALS CORP (JP)
International Classes:
C23C14/34; G11B5/738; G11B5/84; H01F10/30
Domestic Patent References:
| WO2011070850A1 | 2011-06-16 | |||
| WO2014046040A1 | 2014-03-27 | |||
| WO2017141557A1 | 2017-08-24 |
Foreign References:
| JP2012208995A | 2012-10-25 | |||
| JP2011003260A | 2011-01-06 | |||
| JPS6320154A | 1988-01-27 |
Attorney, Agent or Firm:
AXIS PATENT INTERNATIONAL (JP)
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