Title:
SUBSTRATE CLEANING SYSTEM AND SUBSTRATE CLEANING METHOD
Document Type and Number:
WIPO Patent Application WO/2021/117485
Kind Code:
A1
Abstract:
The present invention relates to a substrate cleaning system and substrate cleaning method for cleaning a substrate. This substrate cleaning system (50) includes a heater (51), a liquid medicine diluting module (52), and a cleaning module. The temperature of a diluted liquid medicine mixed at the liquid medicine diluting module (52) is determined to be higher than room temperature and lower than the glass transition point of a cleaning member. The cleaning member scrubs a substrate (W) with the diluted liquid medicine having the determined temperature having been supplied to the substrate (W).
Inventors:
TAKAHASHI HIROKI (JP)
SATO KOHEI (JP)
FUKAYA KOICHI (JP)
SATO KOHEI (JP)
FUKAYA KOICHI (JP)
Application Number:
PCT/JP2020/043805
Publication Date:
June 17, 2021
Filing Date:
November 25, 2020
Export Citation:
Assignee:
EBARA CORP (JP)
International Classes:
H01L21/304
Domestic Patent References:
| WO2018124211A1 | 2018-07-05 |
Foreign References:
| JP2016167514A | 2016-09-15 | |||
| JP2015023165A | 2015-02-02 | |||
| JP2015168035A | 2015-09-28 | |||
| JP2015201627A | 2015-11-12 |
Attorney, Agent or Firm:
HIROSAWA, Tetsuya et al. (JP)
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