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Patent Searching and Data


Title:
SUBSTRATE DRYING CHAMBER
Document Type and Number:
WIPO Patent Application WO/2020/213852
Kind Code:
A1
Abstract:
A substrate drying chamber according to the present invention comprises: a heater part which is built in at least one among an upper housing and a lower housing; a substrate mounting plate which is coupled to the bottom surface of the lower housing and on which a substrate having an organic solvent formed thereon is mounted; an integrated supply/discharge port which extends from one side surface to the other side surface of the lower housing, is formed so as to face the substrate mounting plate from an intermediate region between the one side surface and the other side surface, and provides a supply path for supercritical fluid for initial compression and a discharge path for mixed fluid in which the organic solvent formed on the substrate has dissolved after a drying process; and an upper supply port which is formed in the central region of the upper housing so as to face the substrate mounting plate, and provides a supply path for supercritical fluid for drying.

Inventors:
SHIN HEE YONG (KR)
YOON BYOUNG MOON (KR)
Application Number:
PCT/KR2020/004270
Publication Date:
October 22, 2020
Filing Date:
March 27, 2020
Export Citation:
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Assignee:
MUJIN ELECTRONICS CO LTD (KR)
International Classes:
H01L21/67; H01L21/683
Foreign References:
KR20190002112A2019-01-08
KR20140112638A2014-09-24
KR20110058037A2011-06-01
KR20130014311A2013-02-07
KR20180125763A2018-11-26
Attorney, Agent or Firm:
DARAE LAW & IP, LLC (KR)
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