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Patent Searching and Data


Title:
SUBSTRATE PROCESSING DEVICE AND SUBSTRATE PROCESSING METHOD
Document Type and Number:
WIPO Patent Application WO/2018/030357
Kind Code:
A1
Abstract:
A substrate processing device that transports a longitudinal sheet substrate in the longitudinal direction and carries out a predetermined process on the sheet substrate, wherein the device is provided with: a processing mechanism that carries out a predetermined process for each portion of the sheet substrate in the longitudinal direction; a transport mechanism that transports the sheet substrate at a predetermined speed in the longitudinal direction while applying a predetermined tensile force to the sheet substrate that passes through the processing mechanism; an anchoring mechanism that is disposed in a specific position along a transport pathway for the sheet substrate and is capable of anchoring the sheet substrate to a specific position; and a control device that, when transport of the sheet substrate is temporarily stopped, controls the transport mechanism to reduce the transport speed of the sheet substrate, and controls the anchoring mechanism so that the sheet substrate is anchored to a specific position at the point in time at which the transport speed reaches a predetermined value or less.

Inventors:
KITO YOSHIAKI (JP)
KATO MASAKI (JP)
NARA KEI (JP)
HORI MASAKAZU (JP)
KIUCHI TOHRU (JP)
Application Number:
PCT/JP2017/028634
Publication Date:
February 15, 2018
Filing Date:
August 07, 2017
Export Citation:
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Assignee:
NIPPON KOGAKU KK (JP)
International Classes:
B65H26/00; B65G49/06; B65H23/188; G03F7/20; G03F7/24; H01L21/677; H01L21/683
Foreign References:
JP2000095402A2000-04-04
JP2004144862A2004-05-20
JP2005148353A2005-06-09
JP2000246868A2000-09-12
JPH06227720A1994-08-16
JP2010222071A2010-10-07
JPH11102077A1999-04-13
JP2003335443A2003-11-25
Attorney, Agent or Firm:
CHIBA Yoshihiro et al. (JP)
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