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Patent Searching and Data


Title:
SUBSTRATE PROCESSING DEVICE AND SUBSTRATE TRANSFER METHOD
Document Type and Number:
WIPO Patent Application WO/2019/039316
Kind Code:
A1
Abstract:
A load lock chamber comprises: a plurality of stages on which a plurality of first substrates that are loaded at once by means of a second transfer mechanism are respectively mounted; a moving mechanism which, in a state in which the plurality of first substrates are respectively mounted on the plurality of stages, moves the plurality of stages to narrow the interval between the plurality of stages; and a rotating mechanism which, when the plurality of first substrates are unloaded one by one by means of a first transfer mechanism, rotates the plurality of stages with the narrowed interval about an axis, and causes the plurality of first substrates successively to become closer to the first transfer mechanism around the axis.

Inventors:
HIROKI TSUTOMU (JP)
Application Number:
PCT/JP2018/030037
Publication Date:
February 28, 2019
Filing Date:
August 10, 2018
Export Citation:
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Assignee:
TOKYO ELECTRON LTD (JP)
International Classes:
H01L21/677; H01L21/31
Foreign References:
US20140064886A12014-03-06
US20170040204A12017-02-09
JP2002520833A2002-07-09
JPH10242234A1998-09-11
JP2009043755A2009-02-26
Attorney, Agent or Firm:
SAKAI INTERNATIONAL PATENT OFFICE (JP)
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