Title:
SUBSTRATE PROCESSING DEVICE
Document Type and Number:
WIPO Patent Application WO/2012/133218
Kind Code:
A1
Abstract:
The invention is provided with: a plurality of vacuum transport chambers situated in proximity to a plurality of processing chambers for processing a substrate in a reduced-pressure atmosphere, the vacuum transport chambers having in the interior thereof a transport mechanism for transporting the substrate in and out between the processing chambers; one or more load lock chambers furnished individually to each of the plurality of vacuum transport chambers; a first atmospheric transport mechanism for transporting an externally supplied substrate into one of the load lock chambers; and a second atmospheric transport mechanism for receiving the substrate from the first atmospheric transport mechanism and transporting the received substrate into another of the load lock chambers. The second atmospheric transport mechanism is arranged to the upper side or lower side of the vacuum transport chambers furnished with the one load lock chamber, and the plurality of vacuum transport chambers are arranged in series along the direction in which the substrate is transported by the second atmospheric transport mechanism.
Inventors:
KOBAYASHI SENSHO (JP)
Application Number:
PCT/JP2012/057578
Publication Date:
October 04, 2012
Filing Date:
March 23, 2012
Export Citation:
Assignee:
TOKYO ELECTRON LTD (JP)
KOBAYASHI SENSHO (JP)
KOBAYASHI SENSHO (JP)
International Classes:
H01L21/677
Domestic Patent References:
| WO2008129617A1 | 2008-10-30 |
Foreign References:
| JP2004349503A | 2004-12-09 | |||
| JP2009260087A | 2009-11-05 |
Attorney, Agent or Firm:
ITOH, TADAHIKO (JP)
Tadahiko Ito (JP)
Tadahiko Ito (JP)
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