Title:
SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING DEVICE
Document Type and Number:
WIPO Patent Application WO/2021/039322
Kind Code:
A1
Abstract:
The present invention holds a substrate (WF) having a first surface (S1) and a second surface (S2) on the opposite side to the first surface (S1). Pressurized ozone water (LQ) is arranged upon the second surface (S2) of the substrate (WF). Ozone water is heated at a Point of Use (POU) for treatment on the substrate.
Inventors:
INABA MASAKI (JP)
MURAMOTO RYO (JP)
SOTOKU KOTA (JP)
NAMBA TOSHIMITSU (JP)
YOSHIHARA NAOHIKO (JP)
MURAMOTO RYO (JP)
SOTOKU KOTA (JP)
NAMBA TOSHIMITSU (JP)
YOSHIHARA NAOHIKO (JP)
Application Number:
PCT/JP2020/029954
Publication Date:
March 04, 2021
Filing Date:
August 05, 2020
Export Citation:
Assignee:
SCREEN HOLDINGS CO LTD (JP)
International Classes:
H01L21/027; B08B3/10; H01L21/304
Foreign References:
| JP2002261068A | 2002-09-13 | |||
| JP2001077069A | 2001-03-23 | |||
| JP2006093473A | 2006-04-06 | |||
| JP2017175041A | 2017-09-28 | |||
| JP2006303143A | 2006-11-02 |
Attorney, Agent or Firm:
YOSHITAKE Hidetoshi et al. (JP)
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