Title:
SUBSTRATE ROTATING DEVICE
Document Type and Number:
WIPO Patent Application WO/2021/075074
Kind Code:
A1
Abstract:
This substrate rotating device comprises a main rotating mechanism, a sub rotating mechanism, and a guide structure. The main rotating mechanism rotates about a first rotation axis. The main rotating mechanism comprises a sub rotation mechanism. The sub rotating mechanism revolves around the first rotation axis accompanying the rotation of the main rotating mechanism and rotates about a second rotation axis. The second rotation axis displaces in a radial direction with respect to the first rotation axis. The guide structure has a contact surface extending in the circumferential direction with respect to the first rotation axis. The guide structure controls the radial displacement of the second rotation axis and causes the sub rotating mechanism to revolve in a track along the contact surface when the contact surface and the sub rotating mechanism come into contact with each other.
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Inventors:
UEHARA NOBORU (JP)
Application Number:
PCT/JP2020/014868
Publication Date:
April 22, 2021
Filing Date:
March 31, 2020
Export Citation:
Assignee:
SANTEC CORP (JP)
International Classes:
C23C14/50; G02B1/115; H01L21/68
Foreign References:
| JPH0688227A | 1994-03-29 | |||
| KR20110072905A | 2011-06-29 | |||
| JPS58132755A | 1983-08-08 |
Attorney, Agent or Firm:
NAGOYA INTERNATIONAL PATENT FIRM (JP)
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