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Patent Searching and Data


Title:
SUBSTRATE TREATING APPARATUS
Document Type and Number:
WIPO Patent Application WO/2012/169754
Kind Code:
A2
Abstract:
Provided is a substrate treating apparatus. In the substrate treating apparatus according to the present invention, a holder is disposed to remain within a chamber, and only a substrate is loaded into the chamber or unloaded from the chamber. Thus, since it takes relatively little energy and time to re-heat the holder, the productivity in a substrate treating process may be improved.

Inventors:
KANG HO YOUNG (KR)
CHO BYUNG HO (KR)
Application Number:
PCT/KR2012/004397
Publication Date:
December 13, 2012
Filing Date:
June 04, 2012
Export Citation:
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Assignee:
TERA SEMICON CORP (KR)
KANG HO YOUNG (KR)
CHO BYUNG HO (KR)
International Classes:
H01L21/683; G02F1/13; H01L21/324
Foreign References:
JPH06349775A1994-12-22
KR20100026274A2010-03-10
KR20100008722A2010-01-26
KR20080082270A2008-09-11
KR20090030231A2009-03-24
KR20100106042A2010-10-01
KR20110006091A2011-01-20
Attorney, Agent or Firm:
KIM, HAN (KR)
김한 (KR)
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Claims: