SUBSTRATE TREATING APPARATUS - TERA SEMICON CORP

Title:

SUBSTRATE TREATING APPARATUS

Document Type and Number:

WIPO Patent Application WO/2012/169754

Kind Code:

A3

Abstract:

Provided is a substrate treating apparatus. In the substrate treating apparatus according to the present invention, a holder is disposed to remain within a chamber, and only a substrate is loaded into the chamber or unloaded from the chamber. Thus, since it takes relatively little energy and time to re-heat the holder, the productivity in a substrate treating process may be improved.

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Inventors:

KANG HO YOUNG (KR)
CHO BYUNG HO (KR)

Application Number:

PCT/KR2012/004397

Publication Date:

April 04, 2013

Filing Date:

June 04, 2012

Export Citation:

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Assignee:

TERA SEMICON CORP (KR)
KANG HO YOUNG (KR)
CHO BYUNG HO (KR)

International Classes:

H01L21/683; G02F1/13; H01L21/324

Foreign References:

JPH06349775A	1994-12-22
KR20100026274A	2010-03-10
KR20100008722A	2010-01-26
KR20080082270A	2008-09-11
KR20090030231A	2009-03-24
KR20100106042A	2010-10-01
KR20110006091A	2011-01-20

Attorney, Agent or Firm:

KIM, Han (Seoul 135-909, KR)

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