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Title:
SULFONIUM SALT, ACID GENERATOR, RESIST COMPOSITION, AND METHOD FOR PRODUCING DEVICE
Document Type and Number:
WIPO Patent Application WO/2021/095356
Kind Code:
A1
Abstract:
This sulfonium salt is represented by general formula (1). (In general formula (1), R1 to R3 are each independently an alkyl group having 1-30 carbon atoms, an aryl group having 6-30 carbon atoms or a heteroaryl group having 4-30 carbon atoms, with at least one carbon-carbon single bond in the alkyl group able to be substituted with a carbon-carbon double bond or a carbon-carbon triple bond, and at least one methylene group contained in the alkyl group able to be substituted with a divalent heteroatom-containing group selected from the group consisting of -O-, -CO-, -NH-, -S-, -SO- and -SO2-; Ar1 is an arylene group having 6-30 carbon atoms; at least one of R1 to R3 and Ar1 has at least one substituent group (R) selected from the group consisting of a monovalent organic group having 1-20 carbon atoms, an amino group, a hydroxyl group, a cyano group, a nitro group and a halogen atom; at least two of R1 to R3, Ar1 and the substituent group (R) may form a ring with a sulfur atom and/or A bonded to R1 to R3 or Ar1, either directly by means of a single bond or via any divalent group selected from the group consisting of an oxygen atom, a sulfur atom, a nitrogen atom-containing group and an alkylene group; A is a divalent group selected from the group consisting of -S-, -SO- and -SO2-; A in Ar1 is substituted at the ortho-position with respect to a sulfonio group (S+); and X- is an anion.)

Inventors:
SUGA YUSUKE (JP)
UTSUMI YOSHIYUKI (JP)
Application Number:
PCT/JP2020/035151
Publication Date:
May 20, 2021
Filing Date:
September 16, 2020
Export Citation:
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Assignee:
TOYO GOSEI CO LTD (JP)
International Classes:
C07C381/12; C09K3/00; G03F7/004; G03F7/039; G03F7/20
Domestic Patent References:
WO2007061024A12007-05-31
Foreign References:
JP2019131512A2019-08-08
JP2005239877A2005-09-08
US6215021B12001-04-10
JP2008120700A2008-05-29
JPH10282669A1998-10-23
Other References:
OYAIZU KENICHI, MATSUBARA RYOHEI, IWASAKI TOMOKAZU, TSUCHIDA EISHUN: "Heteropolyacene with thianthrenium ring systems proving z electron delocalization over S atoms", JOURNAL OF MACROMOLECULAR SCIENCE, PURE AND APPLIED CHEMISTRY, vol. A40, no. 7, 2003, pages 655 - 670, XP055823393
NENAJDENKO,V.G. ET AL.: "Oxidative Properties of Triflic Anhydride", OXIDATION OF ALCOHOLS AND SULFIDES, JOURNAL OF ORGANIC CHEMISTRY, vol. 62, no. 8, 1997, pages 2483 - 2486, XP002117750
CARIOU,M ET AL.: "ANODIC OXIDATION OF SULFUR BRIDGED HEXAMETHOXYBIPHENYL COMPOUNDS : ISOLATION OF A STABLE MIXED-VALENCE SALT OF 2,3,4,6,7,8-HEXAMETHOXYBC,FG1,4DITHIAPE NTALENE", NEW JOURNAL OF CHEMISTRY, vol. 20, no. 10, 1996, pages 1031 - 1039
ELINSON,M.N. ET AL.: "A general survey on the anodic behavior of aromatic thioethers in organic solvents of low nucleophilicity", JOURNAL OF ELECTROANALYTICAL CHEMISTRY, vol. 350, no. 1-2, 1993, pages 117 - 32, XP026533594, DOI: 10.1016/0022-0728(93)80200-2
KROLLPFEIFFER,F. ET AL.: "The formation of diarylalkylsulfonium salts by the action of concentrated sulfuric acid on thiophenol alkyl ethers", CHEMISCHE BERICHTE, vol. 86, no. 1049-57, 1953, pages 1049 - 57
HAMASHIMA TOSHIHIKO, MORI YOSHIAKI, SAWADA KAZUNORI, KASAHARA YUKO, MURAYAMA DAISUKE, KAMEI YUTO, OKUNO HIROAKI, YOKOYAMA YUUSAKU,: "A practical regioselective synthesis of alkylthio-or arylthioindoles without the use of smelly compounds such as thiols", CHEMICAL & PHARMACEUTICAL BULLETIN, vol. 61, no. 3, 2013, pages 292 - 303, XP055823402
Attorney, Agent or Firm:
SK INTELLECTUAL PROPERTY LAW FIRM et al. (JP)
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