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Patent Searching and Data


Title:
SUPER-HYDROPHOBIC PHOTOSENSITIVE RESIN COMPOSITION AND BLACK MATRIX THEREOF
Document Type and Number:
WIPO Patent Application WO/2011/016655
Kind Code:
A3
Abstract:
Provided is a super-hydrophobic photosensitive resin composition for preparing a black matrix used to block light in a liquid crystal display. More specifically, a super-hydrophobic photo-sensitive resin composition for preparing a black matrix having superior heat resistance, chemical resistance, development process margin and adhesivity, including a first polymer and a second polymer and a black matrix prepared therefrom are disclosed.

Inventors:
CHOI GYUNG-SIK (KR)
HAN SEOK (KR)
LEE MOO YOUNG (KR)
Application Number:
PCT/KR2010/005074
Publication Date:
June 09, 2011
Filing Date:
August 02, 2010
Export Citation:
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Assignee:
ROHM & HAAS ELECT MAT (KR)
CHOI GYUNG-SIK (KR)
HAN SEOK (KR)
LEE MOO YOUNG (KR)
International Classes:
G03F7/027; G03F7/004; G03F7/028
Foreign References:
KR20060084983A2006-07-26
KR20060090594A2006-08-14
KR20030093514A2003-12-11
KR20050101920A2005-10-25
Attorney, Agent or Firm:
KWON, Oh-Sig et al. (921 Dunsan-dong Seo-gu, Daejeon 302-120, KR)
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