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Patent Searching and Data


Title:
SURFACE ACOUSTIC WAVE FILTER PRODUCTION METHOD AND SURFACE ACOUSTIC WAVE FILTER
Document Type and Number:
WIPO Patent Application WO/2021/226826
Kind Code:
A1
Abstract:
A surface acoustic wave filter production method and a surface acoustic wave filter, relating to the field of surface acoustic wave, and capable of reducing the difficulty in making pistons and reducing the production costs of surface acoustic wave filters. The production method comprises: forming on a piezoelectric substrate a first photoresist pattern layer having a first hollow pattern, wherein the first hollow pattern comprises a part having the same shape as an interdigital transducer (100); forming a first metal film on the first photoresist pattern layer, the first metal film forming an interdigital transducer in an area of the first hollow pattern (200); forming on the first metal film a second photoresist pattern layer having a second hollow pattern (300); forming a second metal film on the second photoresist pattern layer, the second metal film forming a harmonic suppression structure on the surfaces of an input reflection grid and an output reflection grid located in the area of the second hollow pattern, respectively (400); and removing a film layer on the first photoresist pattern layer and the first photoresist pattern layer (500).

Inventors:
CHEN, Peng (CN)
ZHANG, Qiang (CN)
LI, Wei (CN)
Application Number:
PCT/CN2020/089783
Publication Date:
November 18, 2021
Filing Date:
May 12, 2020
Export Citation:
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Assignee:
HUAWEI TECHNOLOGIES CO., LTD. (CN)
International Classes:
H03H9/02; H03H9/25
Attorney, Agent or Firm:
BEIJING RUN ZEHENG INTELLECTUAL PROPERTY LAW FIRM (CN)
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