Title:
SYSTEM AND METHOD FOR ACCURATE APPLICATION AND CURING OF NAIL POLISH
Document Type and Number:
WIPO Patent Application WO/2019/199921
Kind Code:
A8
Abstract:
A nail polish application system may include a nail polish applicator (40, 100, 200) to apply a curable nail polish to a nail of a user. An energy source (50) may emit energy to selectively cure the curable nail polish. A sensor (20) may be provided to detect a boundary of the nail of the user. The energy source may be configured to direct the energy to (i) the detected boundary of the nail during a first curing stage or (ii) to an area within the detected boundary of the nail during the first curing stage, and to (iii) avoid directing the energy to an area outside the detected boundary of the nail during the first curing stage.
Inventors:
LEONG BRADLEY (US)
Application Number:
PCT/US2019/026720
Publication Date:
November 12, 2020
Filing Date:
April 10, 2019
Export Citation:
Assignee:
CORAL LABS INC (US)
International Classes:
A45D29/14
Attorney, Agent or Firm:
LUND, Stephen, M. et al. (US)
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