Title:
SYSTEM FOR PROCESSING WAFERS
Document Type and Number:
WIPO Patent Application WO2000068974
Kind Code:
A3
Abstract:
The invention relates to a system for processing wafers in at least one clean room (1). The inventive system comprises an arrangement of production units (2) for carrying out individual production steps and a transport system for transporting the wafers between different production units (2). Furthermore, at least one control station (7) is provided for automatically tracking and controlling the material flow of the wafers. Process data is read in the control station (7) by the production units (2) and/or the transport system.
More Like This:
Inventors:
KLAEBSCH ROLF-ARNO (DE)
HUBER RONALD (US)
HUBER RONALD (US)
Application Number:
PCT/DE2000/001452
Publication Date:
April 05, 2001
Filing Date:
May 05, 2000
Export Citation:
Assignee:
INFINEON TECHNOLOGIES AG (DE)
KLAEBSCH ROLF ARNO (DE)
HUBER RONALD (US)
KLAEBSCH ROLF ARNO (DE)
HUBER RONALD (US)
International Classes:
G05B19/418; G07C3/00; H01L21/00; (IPC1-7): H01L21/00
Foreign References:
EP0884765A2 | 1998-12-16 | |||
US5751581A | 1998-05-12 | |||
US5672230A | 1997-09-30 | |||
US6050768A | 2000-04-18 | |||
EP0915507A1 | 1999-05-12 |
Download PDF:
Previous Patent: SYSTEM FOR TREATING WAFERS
Next Patent: SYSTEM FOR MANUFACTURING SEMICONDUCTOR PRODUCTS
Next Patent: SYSTEM FOR MANUFACTURING SEMICONDUCTOR PRODUCTS