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Patent Searching and Data


Title:
SYSTEMS AND METHODS FOR EVALUATING CRITICAL DIMENSIONS BASED ON DIFFRACTION-BASED OVERLAY METROLOGY
Document Type and Number:
WIPO Patent Application WO/2021/072743
Kind Code:
A1
Abstract:
Systems and methods for evaluating critical dimensions of a semiconductor device are provided. An exemplary system includes at least one processor and at least one memory storing instructions. The instructions, when executed by the at least one processor, cause the at least one processor to perform operations. The operations include receiving information of a first set of overlay markings on a first layer of the semiconductor device and information of a second set of overlay markings on a second layer of the semiconductor device. The first layer is lower than the second layer. The operations also include receiving a plurality of diffraction parameters measured from corresponding overlay markings on the first and second layers. The operations further include determining a variation of the critical dimensions on the second layer based on the plurality of diffraction parameters.

Inventors:
FENG YAOBIN (CN)
Application Number:
PCT/CN2019/111943
Publication Date:
April 22, 2021
Filing Date:
October 18, 2019
Export Citation:
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Assignee:
YANGTZE MEMORY TECH CO LTD (CN)
International Classes:
H01L21/66
Foreign References:
CN109427749A2019-03-05
CN104520982A2015-04-15
CN107924852A2018-04-17
CN101174581A2008-05-07
US20050158636A12005-07-21
CN108695184A2018-10-23
Attorney, Agent or Firm:
NTD UNIVATION INTELLECTUAL PROPERTY AGENCY LTD. (CN)
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