Title:
TARGET MATERIAL WASHING METHOD, TARGET MATERIAL PRODUCTION METHOD, AND RECYCLED INGOT PRODUCTION METHOD
Document Type and Number:
WIPO Patent Application WO/2020/166553
Kind Code:
A1
Abstract:
The present invention addresses the problem of providing: a target material washing method whereby it becomes possible to remove impurities derived from a bonding material constituting a bonding layer and a support member from a used target material by blasting simply and sufficiently; a target material production method including treating by the washing method; and a recycled ingot production method using a target material produced by the aforementioned method as a raw material. The target material washing method of the present invention is a method for washing a target material separated from a sputtering target composed of the target material and a support member bonded to each other with a bonding material, the method comprising spraying a polishing material having a new Mohs hardness of 3 or more and a bulk specific gravity of 2 g/cm3 or less onto a first surface at which the target material and the support member are bonded to each other in the target material.
Inventors:
NISHIOKA KOJI (JP)
TSUKADA HIROYUKI (JP)
TOKUNAGA NAOKI (JP)
TSUKADA HIROYUKI (JP)
TOKUNAGA NAOKI (JP)
Application Number:
PCT/JP2020/005102
Publication Date:
August 20, 2020
Filing Date:
February 10, 2020
Export Citation:
Assignee:
SUMITOMO CHEMICAL CO (JP)
International Classes:
C23C14/34; B24C1/10; B24C5/02; B24C11/00
Foreign References:
| JP2003082455A | 2003-03-19 | |||
| JP2007302556A | 2007-11-22 | |||
| JP2005023350A | 2005-01-27 | |||
| CN102605331A | 2012-07-25 | |||
| JP2018168443A | 2018-11-01 | |||
| JPH10298743A | 1998-11-10 |
Other References:
"List of Abrasives Handled", FUJI SEISAKUSHO CO., LTD., 28 January 2020 (2020-01-28), XP055737134, Retrieved from the Internet
Attorney, Agent or Firm:
NAKAYAMA, Tohru et al. (JP)
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