Title:
TARGET
Document Type and Number:
WIPO Patent Application WO/2021/054136
Kind Code:
A1
Abstract:
Provided is a target which has high magnetic flux leakage, undergoes the generation of a reduced amount of particles during sputtering, and is useful for, for example, the manufacturing of a magnetic recording medium. A target represented by a compositional formula: Ni100-X-Y-FeX-WY (wherein 5 ≤ X ≤ 40, 1 ≤ Y ≤ 15) in terms of atomic ratios, with the remainder made up by unavoidable impurities, wherein a FeW phase is dispersed in a matrix phase comprising NiW. In the target, it is more preferred that there are less than one FeW phase having an inscribed circle diameter of 400 μm or more and less than one W phase having an inscribed circle diameter of 15 μm or more per 0.12 mm2.
Inventors:
FUKUOKA JUN (JP)
FUJIMOTO MITSUHARU (JP)
FUJIMOTO MITSUHARU (JP)
Application Number:
PCT/JP2020/033403
Publication Date:
March 25, 2021
Filing Date:
September 03, 2020
Export Citation:
Assignee:
HITACHI METALS LTD (JP)
International Classes:
C23C14/34; G11B5/738; G11B5/84
Foreign References:
| JP2016145394A | 2016-08-12 | |||
| CN104651788A | 2015-05-27 | |||
| JP2002222518A | 2002-08-09 |
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