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Patent Searching and Data


Title:
TEMPERATURE CONTROL DEVICE OF DIFFUSION FURNACE FOR WAFER DEPOSITION
Document Type and Number:
WIPO Patent Application WO/2022/169143
Kind Code:
A1
Abstract:
The present invention relates to a temperature control device of a diffusion furnace for wafer deposition, wherein the diffusion furnace for wafer deposition comprises a reaction tube in which a boat for accommodating a wafer and rotating in one direction is accommodated. The temperature control device comprising: a heater unit installed along the circumference of the reaction tube and individually heating a plurality of regions of the reaction tube divided in the longitudinal direction; an internal thermocouple thermometer installed inside each region of the reaction tube and detecting an internal temperature of the reaction tube; an external thermocouple thermometer installed outside each region of the reaction tube and detecting an internal temperature of the diffusion furnace; a camera unit which is installed inside the reaction tube to be at least tiltable or vertically movable with respect to the side of the boat and includes at least one thermal imaging camera for taking infrared images of a plurality of wafers accommodated in the boat; and a control unit for controlling operation of the heater unit on the basis of the internal temperature of the reaction tube detected from the internal thermocouple thermometer, the internal temperature of the diffusion furnace detected from the external thermocouple thermometer, and the temperature of each wafer detected from the camera unit.

Inventors:
LIM TAE HWA (KR)
HAN JONG HOON (KR)
Application Number:
PCT/KR2022/001134
Publication Date:
August 11, 2022
Filing Date:
January 21, 2022
Export Citation:
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Assignee:
RC TECH CO LTD (KR)
International Classes:
C30B31/12; C30B31/18; G01J5/00; H01L21/67; H04N7/18
Foreign References:
JP2017215274A2017-12-07
KR20000074726A2000-12-15
KR19980059775A1998-10-07
JPH06204143A1994-07-22
KR20050024682A2005-03-11
KR102304462B12021-09-24
Attorney, Agent or Firm:
BAEK, Jong Ung et al. (KR)
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