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Patent Searching and Data


Title:
TEMPLATE, TEMPLATE BLANK AND IMPRINT TEMPLATE BOARD MAKING METHOD, IMPRINT TEMPLATE MAKING METHOD, AND TEMPLATE
Document Type and Number:
WIPO Patent Application WO/2017/204260
Kind Code:
A1
Abstract:
In order to suppress the influence of leakage of exposure light in an imprint process, while maintaining a required height of transfer pattern area, a template (1) and a template blank, for use in an imprint lithography for transferring a transfer pattern (23) of projections-and-depressions structure to a resin on a transferred board, are configured such that: a first step structure (21) is formed on the main surface of a base (10); a second step structure (22) is formed on the first step structure (21); and that area of the top surface of the first step structure (21) which is outside the second step structure (22) is covered with a light-shielding film (21).

Inventors:
NAGAI TAKAHARU (JP)
SUZUKI KATSUTOSHI (JP)
ICHIMURA KOJI (JP)
YOSHIDA KOUJI (JP)
Application Number:
PCT/JP2017/019415
Publication Date:
November 30, 2017
Filing Date:
May 24, 2017
Export Citation:
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Assignee:
DAINIPPON PRINTING CO LTD (JP)
International Classes:
H01L21/027; B29C33/38; B29C59/02
Foreign References:
JP2009023113A2009-02-05
JP2013168604A2013-08-29
JP2007103915A2007-04-19
JP2014011254A2014-01-20
JP2016072415A2016-05-09
JP2014172316A2014-09-22
JP2015170828A2015-09-28
JP2013016734A2013-01-24
JP2010258259A2010-11-11
JP2014195088A2014-10-09
Attorney, Agent or Firm:
YAMASHITA, Akihiko et al. (JP)
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