Title:
THIN FILM-ATTACHED SUBSTRATE, MULTILAYERED REFLECTIVE FILM-ATTACHED SUBSTRATE, REFLECTIVE MASK BLANK, REFLECTIVE MASK, AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE
Document Type and Number:
WIPO Patent Application WO/2020/261986
Kind Code:
A1
Abstract:
Provided is a thin film-attached substrate having a thin film having excellent chemical resistance. The thin film-attached substrate is characterized by including a thin film on at least one main surface of two main surfaces of the substrate, wherein: the thin film contains chromium; and when the diffraction X-ray intensity with respect to a diffraction angle 2θ is measured for the thin film by an X-ray diffraction method using CuKa rays, a peak is detected in a range in which the diffraction angle 2θ is 56-60 degrees.
Inventors:
NAKAGAWA MASANORI (JP)
UCHIDA TAKASHI (JP)
UCHIDA TAKASHI (JP)
Application Number:
PCT/JP2020/022781
Publication Date:
December 30, 2020
Filing Date:
June 10, 2020
Export Citation:
Assignee:
HOYA CORP (JP)
International Classes:
G03F1/22; G03F7/20
Domestic Patent References:
| WO2007074806A1 | 2007-07-05 | |||
| WO2007099910A1 | 2007-09-07 |
Foreign References:
| JPH0695362A | 1994-04-08 | |||
| JPH05297570A | 1993-11-12 |
Attorney, Agent or Firm:
TSUKUNI & ASSOCIATES et al. (JP)
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