Title:
THIOPHENE STRUCTURE-CONTAINING OXIME ESTER PHOTOINITIATOR, PREPARATION METHOD, AND PHOTOSENSITIVE RESIN COMPOSITION
Document Type and Number:
WIPO Patent Application WO/2022/048679
Kind Code:
A1
Abstract:
Disclosed are a thiophene structure-containing oxime ester photoinitiator, a preparation method therefor, and a photosensitive resin composition containing the photoinitiator and capable of serving as an alkaline photographic developer. The photoinitiator has the structure as represented by formula A, B, C, D, or E. The photosensitive resin composition is free of gas outflow when exposed to light and has excellent film-forming properties such as line width, edge line neatness, and development process tolerance.
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Inventors:
QIAN XIAOCHUN (CN)
Application Number:
PCT/CN2021/116862
Publication Date:
March 10, 2022
Filing Date:
September 07, 2021
Export Citation:
Assignee:
CHANGZHOU TRONLY NEW ELECTRONIC MAT CO LTD (CN)
CHANGZHOU TRONLY ADVANCED ELECTRONIC MAT CO LTD (CN)
CHANGZHOU TRONLY ADVANCED ELECTRONIC MAT CO LTD (CN)
International Classes:
C07D333/76; C08F2/48; G03F7/027
Domestic Patent References:
| WO2017059772A1 | 2017-04-13 |
Foreign References:
| CN104910053A | 2015-09-16 | |||
| CN102584757A | 2012-07-18 | |||
| CN103998422A | 2014-08-20 | |||
| CN110066352A | 2019-07-30 | |||
| CN110066225A | 2019-07-30 |
Other References:
HARK R R, ET AL.: "SYNTHETIC STUDIES OF NOVEL NINHYDRIN ANALOGS", CANADIAN JOURNAL OF CHEMISTRY, vol. 79, no. 11, 1 January 2001 (2001-01-01), CA , pages 1632 - 1654, XP009032044, ISSN: 0008-4042, DOI: 10.1139/cjc-79-11-1632
Attorney, Agent or Firm:
KANGXIN PARTNERS, P.C. (CN)
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