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Title:
TREATMENT SYSTEM, AND ITS RUNNING METHOD
Document Type and Number:
WIPO Patent Application WO/2007/040278
Kind Code:
A1
Abstract:
Disclosed is a method for running a treatment system provided with a plurality of process modules for subjecting substrates to mutually identical treatments. When each process module is conditioned for preparing the execution of a predetermined process recipe, at each completion of the conditioning of one process module, the sequential transfers of untreated substrates are started on a substrate transfer route from a cassette for housing the untreated substrates to that process module, and the sequential processes on the untreated substrates by using that process module are started. Even if the conditioning time periods are uneven between the process modules of identical specifications, the treatment system can be efficiently run.

Inventors:
SEKIDO KOICHI (JP)
YAMAGUCHI HIROFUMI (JP)
BAE JUNGHWAN (JP)
Application Number:
PCT/JP2006/320109
Publication Date:
April 12, 2007
Filing Date:
October 06, 2006
Export Citation:
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Assignee:
TOKYO ELECTRON LTD (JP)
SEKIDO KOICHI (JP)
YAMAGUCHI HIROFUMI (JP)
BAE JUNGHWAN (JP)
International Classes:
H01L21/677
Foreign References:
JPH1167869A1999-03-09
JP2005101076A2005-04-14
JPH1154587A1999-02-26
JP2001210581A2001-08-03
Attorney, Agent or Firm:
YOSHITAKE, Kenji et al. (Room 323 Fuji Bldg., 2-, Marunouchi 3-chome Chiyoda-ku Tokyo 05, JP)
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