UNDERLAYER FILM-FORMING COMPOSITION FOR FORMING FINE PHASE SEPARATION PATTERN

WIPO Patent Application WO/2018/135455

A1

Provided is an underlayer film-forming composition which exhibits excellent solvent resistance, and which is capable of orthogonally inducing, with respect to a substrate, a microphase separation structure in a layer formed on the substrate, said layer including a block copolymer. The underlayer film-forming composition includes a copolymer which includes: (A) unit structures derived from styrene compounds including tert-butyl groups; (B) unit structures, other than those in (A) above, which are derived from aromatic-containing vinyl compounds which do not include hydroxyl groups; (C) unit structures derived from compounds which include (meth)acryloyl groups, and do not include hydroxyl groups; and (D) unit structures derived from compounds including crosslink-forming groups. The copolymerization ratios with respect to the whole copolymer are: (A) 25-90 mol%; (B) 0-65 mol%; (C) 0-65 mol%; and (D) 10-20 mol%. Unit structures including aromatics account for 81-90 mol% of (A)+(B)+(C).

MIZUOCHI RYUTA (JP)
SOMEYA YASUNOBU (JP)
WAKAYAMA HIROYUKI (JP)
SAKAMOTO RIKIMARU (JP)

PCT/JP2018/000903

July 26, 2018

January 16, 2018

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NISSAN CHEMICAL IND LTD (JP)

C09D125/08; C08F212/12; C08F220/18; C08L25/16; C08L33/10; C09D5/00; C09D133/06; H01L21/027

WO2014098025A1	2014-06-26
WO2014098025A1	2014-06-26

JP2015167163A	2015-09-24
JP2013212489A	2013-10-17
JP2014185311A	2014-10-02
JP2012062365A	2012-03-29
JP2015005750A	2015-01-08
JP2015167163A	2015-09-24
JP2013212489A	2013-10-17
JP2014185311A	2014-10-02
JP2012062365A	2012-03-29
JP2015005750A	2015-01-08

TSUKUNI & ASSOCIATES et al. (JP)

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