Title:
VAPOR-DEPOSITION-MASK CLEANING METHOD AND DISPLAY-DEVICE MANUFACTURING METHOD
Document Type and Number:
WIPO Patent Application WO/2020/065734
Kind Code:
A1
Abstract:
A method for cleaning a vapor-deposition mask (50) having a plurality of vapor-deposition holes (52) includes: a coating step for coating the surface of the vapor-deposition mask (50) with a coating agent containing a surfactant; a cleaning step for cleaning the vapor-deposition mask (50) by radiating ultrasonic wave onto an organic solvent tank (80) in a state in which the vapor-deposition mask (50) is immersed in the organic solvent tank (80), thus degrading the surfactant contained in the coating agent coating the surface; and a drying step for drying the vapor-deposition mask (50).
More Like This:
| JPH09314077 | ULTRASONIC WASHING DEVICE |
Inventors:
INUZUKA MASAHIRO
Application Number:
PCT/JP2018/035503
Publication Date:
April 02, 2020
Filing Date:
September 25, 2018
Export Citation:
Assignee:
SHARP KK (JP)
International Classes:
B08B3/12
Foreign References:
| JP2006193568A | 2006-07-27 | |||
| JP2006328491A | 2006-12-07 | |||
| JPH04318036A | 1992-11-09 |
Attorney, Agent or Firm:
HARAKENZO WORLD PATENT & TRADEMARK (JP)
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