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Title:
WORKPIECE HANDLING SHEET, METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE, AND USE OF WORKPIECE HANDLING SHEET
Document Type and Number:
WIPO Patent Application WO/2022/153878
Kind Code:
A1
Abstract:
A workpiece handling sheet 1 comprises: a substrate 13; an interface abrasion layer 12 laminated on one side of the substrate 13, and capable of interface abrasion through irradiation with laser light; and an adhesive layer 11 laminated on the surface side of the interface abrasion layer 12 opposite to the substrate 13, and composed of a curable film-like adhesive. According to the workpiece handling sheet 1, a small workpiece with a film-like adhesive can be obtained satisfactorily.

Inventors:
NISHIDA TAKUO (JP)
FURUNO KENTA (JP)
FUKUMOTO AKIO (JP)
WAKAYAMA YOJI (JP)
YAMAGUCHI SEITARO (JP)
FURUKAWA YOSHIKI (JP)
Application Number:
PCT/JP2021/048937
Publication Date:
July 21, 2022
Filing Date:
December 28, 2021
Export Citation:
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Assignee:
LINTEC CORP (JP)
International Classes:
B32B27/00; B23K26/57; B32B7/023; B32B27/16; B32B27/18; C09J5/00; C09J7/38; C09J11/06; C09J133/00; C09J133/14; C09J201/00; F21S2/00; G09F9/00; H01L33/48
Domestic Patent References:
WO2019207920A12019-10-31
Foreign References:
JP2014515883A2014-07-03
JP2020149985A2020-09-17
JP2007250598A2007-09-27
JP2010251359A2010-11-04
Attorney, Agent or Firm:
HAYAKAWA Yuzi et al. (JP)
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