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WO/2004/081628A1 |
The invention relates to an optical assembly comprising a first optical system (12), a second optical system (16) and an optical imaging assembly (10, 18', 20) comprising at least one toric mirror (10), said assembly being positioned bet...
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WO/2004/079427A1 |
An optical device for the representation of a central image (10) of an object (1) and at least one lateral image (11, 12, 13, 14) of the same object (1), whereby the length of the real optical path (11, 12, 13, 14) is equal to the length...
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WO/2004/077104A2 |
A reduced size catadioptric objective and system is disclosed. The objective may be employed with light energy having a wavelength in the range of approximately 190 nanometers through the infrared light range. Elements are less than 100 ...
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WO/2004/074881A2 |
A differential interferometric confocal microscope including: a source-side pinhole array; a detector-side pinhole array; and an interferometer that images the array of pinholes of the source-side pinhole array onto a first array of spot...
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WO/2004/074880A2 |
A differential interferometric confocal microscope for measuring an object, the microscope including a source-side pinhole array; a detector-side pinhole array; and an interferometer that images the array of pinholes of the source-side p...
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WO/2004/070434A2 |
An interferometric microscope (110) for making interferometric measurements of locations within an object (60) that is in a medium, there being a mismatch between indices of refraction of said object and said medium, the microscope (110)...
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WO/2004/068187A2 |
An interferometery system (110) for making interferometric measurements of an object, the system including: a beam generation module (124) which during operation delivers an output beam that includes a first beam at a first frequency and...
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WO/2004/068182A2 |
A compact and efficient optical illumination system featuring planar multi-layered LED light source arrays concentrating their polarized or un-polarized output within a limited angular range. The optical system manipulates light emitted ...
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WO/2004/068065A2 |
A method of using an interferometric confocal microscope to measure features of a trench or via in a substrate, wherein the interferometric confocal microscope produces a measurement beam (240), the method involving: focusing the measure...
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WO/2004/068186A2 |
A confocal interferometry system (110) for making measurements of an object (60), the system including an array of pinholes (12) to receive a source beam (24) and act as an array of beamsplitters to separate the source beam into a refere...
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WO/2004/066013A1 |
Disclosed is a catadioptric camera comprising an image plane, an optical axis (1), a main optical system which is provided with at least one mirror (7) that is placed on the optical axis and blocks the view from the image plane to a dead...
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WO/2004/064370A2 |
An image projection system (10) and method is presented for optically projecting an image onto a display surface (20) with visually correct geometry and optimum image quality. The projection system (10) includes an image processing unit ...
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WO/2004/061487A2 |
An optical system for projection photolithography is disclosed. The optical system is a modified Dyson system capable of imaging a large field over both a narrow and a broad spectral range. The optical system includes a positive lens gro...
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WO2003098321A9 |
Apparatus (204) for optical manipulation of a pair of landscape stereoscopic images, such that the side-by-side orientation needed by a pair of human eyes is reoriented to an orientation which is required for recording with a single came...
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WO/2004/059990A2 |
A photon concentrator includes an imaging photon concentrator (13) concentrating photons from a source (70) to an image point (14) and a non-imaging photon concentrator (30). The non-imaging photon concentrator (NIPC) has an entry apertu...
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WO/2004/057400A1 |
The aim of the invention is to obtain aspheric components of the projection characteristics of a mirror optical system and/or to eliminate chromatic errors of an optical system of this type. To achieve this, at least one (M6) of the mirr...
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WO/2004/051223A2 |
The present embodiments provide methods, apparatus and assemblies for use in a producing a desired output beam that meets a desired intensity prescription. An apparatus can include an input surface (155), and an optically active output s...
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WO/2004/051340A1 |
The invention relates to a photographic objective comprising a first (4) and at least one second mirror (5) and at least one lens (8). A barrel (7, 11), inside of which the lens (8) is anchored, is formed by a supporting body (3) of the ...
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WO/2004/048890A1 |
The invention relates to imaging optics (1) comprising imaging means, which have at least one curved surface (2) and, from an object point (4, 5), produce an image (4', 5') in a plane (8). According to the invention, the imaging means ar...
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WO/2004/046783A1 |
The invention relates to equipment which is used for video surveillance, comprising optical means for the formation of a panoramic image and the acquisition of said panoramic image by a camera which transmits video information to a remot...
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WO/2004/046802A1 |
In an optical sheet (400) for a display apparatus, capable of improving luminance of a display image and a display quality, a method of manufacturing the same and a display apparatus having the same, the optical sheet (400) including a f...
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WO/2004/046771A1 |
A projection lens for microlithography comprises a diaphragm (BL) which is arranged at a distance (D) in front of a mirror (S2) of the lens. The diaphragm (BL) has an aperture (28) having an edge contour which is extended (28') in a non-...
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WO2003067632B1 |
Techniques for utilizing a microscope inspection system (100) capable of inspecting specimens (112) at high throughput rates are described. The inspection system achieves the higher throughput rates by utilizing more than one detector ar...
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WO/2004/036316A1 |
An optical arrangement (12), in particular a microlithographic projection exposure system, in particular having rotational asymmetric illumination, e.g. having a slit shaped illumination field, includes at least one optical element (16, ...
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WO/2004/036282A1 |
The invention provides a lightweight high numerical aperture imaging device (1) comprising two rotationally symmetric curved mirrors (1a), (1b), which can be combined with various other components to facilitate solar-powered flight (incl...
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WO/2004/034103A2 |
Micromirror devices, especially for use in digital projection are disclosed. Other applications are contemplated as well. The devices employ a superstructure that includes a mirror supported over a hinge set above a substructure. Various...
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WO/2004/034100A2 |
A method for manufacturing an apparatus and the apparatus being configured to convert a first distribution of an input radiation to a second distribution of output radiation. The method consists of the steps of generating a two-dimension...
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WO/2004/029688A1 |
A light collection system for an arc lamp includes a parabolic reflector having primary and secondary parabolic reflector sections, the secondary parabolic reflector section divided into subsections, resulting in multiple arc images. The...
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WO/2004/029521A1 |
Modular optical concentrating system assembled by multiple equal or similar elements, composed of reflecting surfaces in the form of concentrating parabola (1) and functional curve, realized as collimating parabola (2) or concentrating h...
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WO2004019077A9 |
An optical system includes multiple cubic crystalline optical elements and one or more uniaxial birefringent elements in which the crystal lattices of the cubic crystalline optical elements are oriented with respect to each other to redu...
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WO/2004/029693A1 |
The intermediate image of an image on an LCD module (142) is deflected by reflection mirrors (M1, M2) via a zoom/auto-focus control system (g), and is formed on diffusion glass (131) via a relay lens (b) and the reflection mirrors (M3, M...
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WO/2004/025370A1 |
The invention relates to an optical reproduction system, which can be configured for example as a catadioptric projection lens. Said system comprises an optical axis, a first deflection mirror, which is tilted in relation to the optical ...
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WO/2004/025349A1 |
The invention relates to a catadioptric projection lens (1), which is designed in particular for use in a microlithographic projection exposure system. Said lens comprises, both in a catadioptric part (5) and in a dioptric part (18) that...
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WO/2004/023570A1 |
Apparatus for collecting light from an LED and transmitting it in a nearÂuniform column includes a conical reflector about the base of the LED for collecting light emitted to the sides of the LED, and a lens specially designed to focus ...
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WO/2004/021085A1 |
The invention relates to an optical subsystem, particularly for a projection exposure system for use in microlithography, having a pencil of rays (4) that passes through the optical subsystem, and having at least one optical element upon...
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WO/2004/019105A1 |
A catadioptric projection lens having a catadioptric lens section and a dioptric lens section is disclosed. Its catadioptric lens section comprises a concave mirror and a beam-deflecting device, which, in the case of one embodiment, comp...
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WO/2004/019128A2 |
Optical Projection System and Method for Photolithography. A lithographic immersion projection system and method for projecting an image at high resolution over a wide field of view. The projection system and method include a final lens ...
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WO/2004/011986A1 |
When in use, a platy unit (5) equivalent to a glasses lens and constituted of an optical material is positioned in front of the eyes of a user located in the vicinity of the exit pupil (P) of an image combiner (1). The image combiner (1)...
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WO/2004/010224A2 |
The invention concerns a projection objective for a projection exposure apparatus, said projection exposure apparatus having a primary light source for emitting electromagnetic radiation with a wavelength ≤193 nm. The projection object...
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WO/2004/010200A1 |
According to one exemplary embodiment, a photolithographic reduction projection catadioptric objective is provided and includes a first optical group (G1) and a second substantially refractive optical group (G2) more image forward than t...
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WO/2004/010164A2 |
A catadioptric projection objective which images a pattern arranged in an object plane of the projection objective into the image plane of the projection objective whilst generating a real intermediate image has a catadioptric objective ...
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WO/2004/007241A2 |
A vehicle headlight (12) that employs a plurality of LED units (38) that emit white light. Each LED unit (38) employs chip-on-board technology where LED semiconductor chips (64) are mounted directly to a submount substrate (56) using sol...
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WO/2004/003601A2 |
Techniques for increasing the percentage of light that is transmitted through optical inspection systems (100) that operate in or near the ultraviolet and deep ultraviolet electromagnetic spectrums are described. Along with increasing th...
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WO/2004/003982A1 |
A reflection mirror apparatus, used in a reflection optical system of an exposure apparatus which performs exposure processing by guiding exposure light by reflection, has a mirror having a reflection surface to reflect the exposure ligh...
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WO/2004/003629A1 |
A cylinder lens array and a projection system adopting the same are provided. The cylinder lens array is installed on a path of a light beam emitted from a light source and is comprised of lens cells. The lens cells are arrayed with thei...
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WO/2004/001528A2 |
An improved real image projection device includes a real image projection system (7) for projecting a real image (2) from one or more sources that transmit, reflect, or emit light, and an e-mail capture system that includes a computer, m...
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WO/2004/001480A2 |
The invention relates to a catadioptric projection objective for projecting a pattern, which is located inside the object plane of the projection objective, into the image plane of the projection objective. Said projection objective has,...
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WO/2004/001821A1 |
An optical unit characterized by comprising an X-ray optical element, an airtight container for storing the X-ray optical element airtightly, and valves or operable opening mechanisms mounted to the X-ray inlet and he X-ray outlet of the...
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WO/2004/001457A2 |
A multi-aperture interferometric optical system (10) collects light propagating from a source of light and develops overlapping diffraction patterns (119) on an optical detector (70) that produces output signals for processing to form an...
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WO/2003/104897A2 |
The invention relates to an objective provided with a plurality of lenses, mirrors and at least one beam splitter (20), all mounted in an objective housing (1). At least one of the surfaces (26, 27, 28) of the beam splitting element (20)...
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