Title:
抗菌性ポリマー
Document Type and Number:
Japanese Patent JP2004509220
Kind Code:
A
Abstract:
The present invention provides antimicrobial polymers, composition, and methods for producing the same. The polmyeric composition comprises a polymer having a functional monomeric unit; and an antimicrobial agent attached to the functional monomeric unit. The monomeric unit preferably includes a functional group such as a carboxylate group, a sulfonate group an alkoxide, a phosphate or a phosphonate group. The antimicrobial polymers are preferably antimicrobial textiles, which can be used in a wide variety of applications. Suitable applications include surgeon's gowns, caps, masks, surgical covers, patient drapes, carpeting, bedding material, underwear, socks sports, sportswear and healthcare uniforms.
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Inventors:
Sun, gun
Kim, Yeon, Hi
Kim, Yeon, Hi
Application Number:
JP2002527357A
Publication Date:
March 25, 2004
Filing Date:
August 23, 2001
Export Citation:
Assignee:
The Regents of The University of California
International Classes:
C08J7/00; A01N25/10; A01N33/12; A01N43/40; A01N61/00; A61L2/16; C08L101/00; D06M13/463; D06M13/477; D06M16/00; D06P1/00; D06P1/62; D06P1/66; D06P3/52; D06P3/76; (IPC1-7): C08L101/00; A01N33/12; A01N43/40; A01N61/00; C08J7/00; D06M13/477; D06P1/00; D06P1/62
Attorney, Agent or Firm:
Atsushi Nakajima
Kato Kazunori
Katsuichi Nishimoto
Kato Kazunori
Katsuichi Nishimoto