Title:
導電性ポリマーを含有する研磨用組成物
Document Type and Number:
Japanese Patent JP2006500762
Kind Code:
A
Abstract:
The invention provides a polishing system comprising (a) an abrasive, a polishing pad, a means for oxidizing a substrate, or any combination thereof, (b) a conducting polymer having an electrical conductivity of about 10<-10 >S/cm to about 10<6 >S/cm, and (c) a liquid carrier.
Inventors:
Kelian, Isaac K.
Tsang, Gien
Sun, Fred F.
One, Shumin
Klingenberg, Eric H.
Tsang, Gien
Sun, Fred F.
One, Shumin
Klingenberg, Eric H.
Application Number:
JP2004522604A
Publication Date:
January 05, 2006
Filing Date:
June 25, 2003
Export Citation:
Assignee:
CABOT MICROELECTRONICS CORPORATION
International Classes:
H01L21/304; B24B37/00; C09K3/14; H01L21/321; H01L21/3213
Foreign References:
| WO2000079577A1 | 2000-12-28 |
Attorney, Agent or Firm:
Atsushi Aoki
Takashi Ishida
Tetsuji Koga
Nagasaka Tomoyasu
Masaya Nishiyama
Takashi Ishida
Tetsuji Koga
Nagasaka Tomoyasu
Masaya Nishiyama