Title:
堆積チャンバーの表面強化およびその結果得られる堆積チャンバー
Document Type and Number:
Japanese Patent JP2006520429
Kind Code:
A
Abstract:
Methods for passivating exposed surfaces within an apparatus for depositing thin films on a substrate are disclosed. Interior surfaces of a deposition chamber and conduits in communication therewith are passivated to prevent reactants used in a deposition process and reaction products from adsorbing or chemisorbing to the interior surfaces. The surfaces may be passivated for this purpose by surface treatments, lining, temperature regulation, or combinations thereof. A method for determining a temperature or temperature range at which to maintain a surface to minimize accumulation of reactants and reaction products is also disclosed. A deposition apparatus with passivated surfaces within the deposition chamber and gas flow paths is also disclosed.
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Inventors:
Darderian, Gallo Jay
Sundew, garage es
Dund, Los Es
Carpenter, Craig M
Campbell, Philip H
Sundew, garage es
Dund, Los Es
Carpenter, Craig M
Campbell, Philip H
Application Number:
JP2006500818A
Publication Date:
September 07, 2006
Filing Date:
January 08, 2004
Export Citation:
Assignee:
MICRON TECHNOLOGY,INC.
International Classes:
C23C16/44; H01J37/32; H01L21/205
Attorney, Agent or Firm:
Kazuo Shamoto
Tadashi Masui
Yasushi Kobayashi
Akio Chiba
Hiroyuki Tomita
Shinya Hosokawa
Tadashi Masui
Yasushi Kobayashi
Akio Chiba
Hiroyuki Tomita
Shinya Hosokawa
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