Title:
基板にパターン形成するための改善された方法
Document Type and Number:
Japanese Patent JP2007501431
Kind Code:
A
Abstract:
An aspect of the present invention includes a method of lithography to enhance uniformity of critical dimensions of features patterned onto a workpiece. Said workpiece is coated with a coating sensitive to electromagnetic radiation. An electromagnetic radiation source having an illumination intensity is provided. At least one object pixel of electromagnetic radiation is created. A predetermined pattern is exposed, by using said at least one object pixel, on at least a portion of said workpiece in a first exposure pass with a first dose to provide less than full exposure of said coating sensitive to electromagnetic radiation. Said exposing action is repeated at least until said portion of said coating sensitive to electromagnetic radiation is fully exposed, wherein said dose is increased for every following pass. Said fully exposed coating sensitive to electromagnetic radiation is developed.
Inventors:
Walford, Jonathan
Askebjell, Pell
Eklund, Robert
Foschaug, Hans
Askebjell, Pell
Eklund, Robert
Foschaug, Hans
Application Number:
JP2006522529A
Publication Date:
January 25, 2007
Filing Date:
August 04, 2004
Export Citation:
Assignee:
Micronic Laser Systems Activora Get
International Classes:
G03F1/08; G03C5/00; G03F7/20; H01L21/027
Domestic Patent References:
| JP2001092104A | 2001-04-06 | |||
| JP2000349016A | 2000-12-15 |
Foreign References:
| WO2003023488A1 | 2003-03-20 | |||
| WO2003052516A1 | 2003-06-26 | |||
| WO1997002949A1 | 1997-01-30 |
Attorney, Agent or Firm:
Hideto Asamura
Hajime Asamura
Yutaka Yoshida
Toru Mori
Hajime Asamura
Yutaka Yoshida
Toru Mori