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Title:
相変化材料層を有する多層構造およびその製造方法
Document Type and Number:
Japanese Patent JP2011510496
Kind Code:
A
Abstract:
A method of producing a multilayer structure is provided, wherein the method comprises forming a phase change material layer onto a substrate, forming a protective layer, forming a further layer on the protective layer, patterning the further layer in an first patterning step, patterning the protective layer and the phase change material layer by a second patterning step. In particular, the first patterning step may be an etching step using chemical etchants. Moreover, electrodes may be formed on the substrate before the phase change material layer is formed, e.g. the electrodes may be formed on one level, e.g. may form a planar structure and may not form a vertically structure.

Inventors:
Roman Del Hone
Judy Risoni
Basil Parasif
Application Number:
JP2010542709A
Publication Date:
March 31, 2011
Filing Date:
January 12, 2009
Export Citation:
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Assignee:
NXP B.V.
International Classes:
H01L27/105; H01L45/00
Domestic Patent References:
JPS61239683A1986-10-24
JP2006502578A2006-01-19
JP2006528432A2006-12-14
JP2007073779A2007-03-22
JP2007513494A2007-05-24
JP2007531260A2007-11-01
Foreign References:
US20060284158A12006-12-21
Attorney, Agent or Firm:
Kenji Sugimura
Kiyoshi Kuruma
Keisuke Kawahara