Title:
マイクロリソグラフィ投影露光装置の光学系及び像配置誤差を低減する方法
Document Type and Number:
Japanese Patent JP2013540348
Kind Code:
A
Abstract:
A method of reducing image placement errors in a microlithographic projection exposure apparatus includes providing a mask, a light sensitive layer and a microlithographic projection exposure apparatus which images features of the mask onto the light sensitive surface using projection light. Subsequently, image placement errors associated with an image of the features formed on the light sensitive surface are determined either by simulation or metrologically. Then an input state of polarization of the projection light is changed to an elliptical output state of polarization which is selected such that the image placement errors are reduced.
Inventors:
Ruof Johannes
Neumann Jens Timo
Zimmermann Jorg
Helweg Dirk
Jurgens Dirk
Neumann Jens Timo
Zimmermann Jorg
Helweg Dirk
Jurgens Dirk
Application Number:
JP2013530572A
Publication Date:
October 31, 2013
Filing Date:
September 28, 2010
Export Citation:
Assignee:
Carl Zeiss SGM Gaehha
International Classes:
G02B5/30; H01L21/027; G03F7/20
Domestic Patent References:
| JPH07130633A | 1995-05-19 | |||
| JP2008270502A | 2008-11-06 | |||
| JP2007194537A | 2007-08-02 | |||
| JP2009544146A | 2009-12-10 | |||
| JP2006237616A | 2006-09-07 |
Attorney, Agent or Firm:
Koichi Tsujii
Sadao Kumakura
Fumiaki Otsuka
Takaki Nishijima
Hiroyuki Suda
Hiroshi Uesugi
Nobuyuki Taniguchi
Sadao Kumakura
Fumiaki Otsuka
Takaki Nishijima
Hiroyuki Suda
Hiroshi Uesugi
Nobuyuki Taniguchi