Title:
投影露光システム及び投影露光方法
Document Type and Number:
Japanese Patent JP2013540349
Kind Code:
A
Abstract:
A projection exposure system includes an illumination system configured to illuminate a mask with radiation. The projection exposure system also includes a projection objective configured to project an image of a pattern of the mask onto a radiation-sensitive substrate. The projection exposure system further includes an angle-selective filter arrangement arranged at or close to a field surface of the projection objective in a projection beam path optically downstream of the object surface. The angle-selective filter arrangement is effective to filter radiation incident on the filter arrangement according to an angle-selective filter function.
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Inventors:
Gleupner Paul
Conradi Olaf
Tseisek Kristov
Ulrich Wilhelm
Bayerle Helmut
Gruner Tralf
Greschs Volker
Conradi Olaf
Tseisek Kristov
Ulrich Wilhelm
Bayerle Helmut
Gruner Tralf
Greschs Volker
Application Number:
JP2013530574A
Publication Date:
October 31, 2013
Filing Date:
September 30, 2010
Export Citation:
Assignee:
Carl Zeiss SGM Gaehha
International Classes:
H01L21/027; G02B5/00; G03F7/20
Domestic Patent References:
| JPH0547624A | 1993-02-26 | |||
| JPH0778753A | 1995-03-20 | |||
| JP2006080135A | 2006-03-23 |
Attorney, Agent or Firm:
Koichi Tsujii
Sadao Kumakura
Fumiaki Otsuka
Takaki Nishijima
Hiroyuki Suda
Hiroshi Uesugi
Yoshinori Kishi
Sadao Kumakura
Fumiaki Otsuka
Takaki Nishijima
Hiroyuki Suda
Hiroshi Uesugi
Yoshinori Kishi