Title:
ION BEAM APPARATUS
Document Type and Number:
Japanese Patent JP2018152365
Kind Code:
A
Abstract:
PROBLEM TO BE SOLVED: To provide an ion beam apparatus which can apply an ion beam with an ion energy changed in performing, by an ion beam, observation, processing or measurement, and which realizes ultra high-resolution observation, low-damage observation, high accuracy size measurement, or ultra fine high-speed processing according to setting conditions.SOLUTION: An ion beam apparatus comprises: a gas field ionization ion source which can ionize at least two kinds of gases; an electrostatic objective lens configured of four electrodes; and a controller which stores at least voltages applied to the respective electrodes of the electrostatic lens and a sample voltage to a first acceleration voltage when applying a first kind of gas ions, and voltages applied to the respective electrodes of the electrostatic lens and a sample voltage to a second acceleration voltage different from the first acceleration voltage when applying a second kind of gas ions.SELECTED DRAWING: Figure 1
Inventors:
SHICHI HIROYASU
MATSUBARA SHINICHI
KAWANAMI YOSHIMI
MUTO HIROYUKI
MATSUBARA SHINICHI
KAWANAMI YOSHIMI
MUTO HIROYUKI
Application Number:
JP2018130339A
Publication Date:
September 27, 2018
Filing Date:
July 10, 2018
Export Citation:
Assignee:
HITACHI HIGH TECH CORP
International Classes:
H01J37/28; H01J37/08; H01J37/12; H01J37/248; H01J37/317
Attorney, Agent or Firm:
Polaire Patent Business Corporation