Title:
PHOTORESIST COMPOSITIONS AND METHODS
Document Type and Number:
Japanese Patent JP2018185533
Kind Code:
A
Abstract:
PROBLEM TO BE SOLVED: To provide new photoresists that are useful in a variety of applications, including negative-tone development processes.SOLUTION: Photoresist compositions comprise: a first polymer comprising first units comprising a reactive nitrogen-containing moiety spaced from the polymer backbone, wherein the nitrogen-containing moiety produces a basic cleavage product during lithographic processing of the photoresist composition; an acid generator; and an acid-labile group different from the first polymer.SELECTED DRAWING: None
Inventors:
JANG MIN-KYUNG
RYU EUI-HYUN
HONG CHANG-YOUNG
DONG YEON KIM
RYU EUI-HYUN
HONG CHANG-YOUNG
DONG YEON KIM
Application Number:
JP2018134170A
Publication Date:
November 22, 2018
Filing Date:
July 17, 2018
Export Citation:
Assignee:
ROHM & HAAS ELECTRONIC MAT KOREA LTD
International Classes:
G03F7/004; C08F220/34; G03F7/038; G03F7/039; G03F7/20
Domestic Patent References:
| JP2013014743A | 2013-01-24 | |||
| JP2010047668A | 2010-03-04 | |||
| JP2013218223A | 2013-10-24 | |||
| JP2012144666A | 2012-08-02 | |||
| JP2012032782A | 2012-02-16 | |||
| JP2016212407A | 2016-12-15 |
Foreign References:
| WO2011037246A1 | 2011-03-31 | |||
| US20100151388A1 | 2010-06-17 |
Attorney, Agent or Firm:
Patent Business Corporation Sender International Patent Office