Title:
LITHOGRAPHIC METHOD
Document Type and Number:
Japanese Patent JP2018185534
Kind Code:
A
Abstract:
PROBLEM TO BE SOLVED: To control power of a free electron laser generated radiation received by a lithographic apparatus.SOLUTION: A method for patterning lithographic substrates comprises the steps of using a free electron laser to generate EUV radiation, and delivering the EUV radiation to a lithographic apparatus which projects the EUV radiation onto lithographic substrates. The method further comprises a step of reducing fluctuations in power of the EUV radiation delivered to the lithographic substrates by using a feedback-based control loop to monitor the free electron laser and adjust operation of the free electron laser accordingly.SELECTED DRAWING: Figure 1
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Inventors:
ANDREY NIKIPELOV
WOUTER JOEP ENGELEN
JOHANNES ANTONIUS GERARDUS AKKERMANS
LOOPSTRA ERIK
OLAV FRIJNS
WOUTER JOEP ENGELEN
JOHANNES ANTONIUS GERARDUS AKKERMANS
LOOPSTRA ERIK
OLAV FRIJNS
Application Number:
JP2018135837A
Publication Date:
November 22, 2018
Filing Date:
July 19, 2018
Export Citation:
Assignee:
ASML NETHERLANDS BV
International Classes:
G03F7/20; H05H13/04
Attorney, Agent or Firm:
Yoshiyuki Inaba
Toshifumi Onuki
Akihiko Eguchi
Kazuhiko Naito
Toshifumi Onuki
Akihiko Eguchi
Kazuhiko Naito