Title:
INDIRECT HEATING VAPOR DEPOSITION SOURCE
Document Type and Number:
Japanese Patent JP2019002038
Kind Code:
A
Abstract:
To provide an indirect heating vapor deposition source capable of reducing the amount of deposition of a deposit to an outer liner.SOLUTION: An indirect heating vapor deposition source 21 for heating a vessel (a liner 22) charged with a vapor deposition material 4 by thermo-electrons emitted from an electron source 6 to heat and evaporate the vapor deposition material 4 includes an outer liner 31, an inner liner 32, the electron source 6 and a reflector 23. The inner liner 32 is arranged on the inner side of the outer liner 31 and is charged with the vapor deposition material 4; the electron source 6 supplies electrons for heating the outer liner by electron bombardment; and the reflector 23 is arranged between the inner liner 32 and the outer liner 31 and reflects radiant heat emitted from the outer liner 31.SELECTED DRAWING: Figure 2
Inventors:
SUGAWARA KOJI
KAMIOKA MASANORI
SUZUKI KOSUKE
TAKASHIMA TORU
KAMIOKA MASANORI
SUZUKI KOSUKE
TAKASHIMA TORU
Application Number:
JP2017116089A
Publication Date:
January 10, 2019
Filing Date:
June 13, 2017
Export Citation:
Assignee:
JEOL LTD
International Classes:
C23C14/30; C23C14/24
Domestic Patent References:
| JP2005174987A | 2005-06-30 | |||
| JPH01119663A | 1989-05-11 | |||
| JP2014012892A | 2014-01-23 |
Attorney, Agent or Firm:
Shinto International Patent Office