Title:
TARGET COOLING IN PHYSICAL VAPOR PHASE DEPOSITION SYSTEM
Document Type and Number:
Japanese Patent JP2019060016
Kind Code:
A
Abstract:
To provide an apparatus and method for efficiently cooling a PVD target during physical vapor phase deposition.SOLUTION: A physical vapor phase deposition target assembly includes a cooling channel formed on a backing plate comprising: a raw material, the backing plate having front and rear surfaces and constituted so as to support the raw material on the front surface, an injection end portion constituted to be connected to cooling fluid; a discharging end portion fluidly connected to the injection end portion; and a plurality of circular arc portions connected to each other by a plurality of curved portions between the injection end portion and the discharging end portion. The backing plate is constituted so as to cool the raw material during physical vapor phase deposition.SELECTED DRAWING: None
Inventors:
SANJAY BHAT
VIBHU JINDAL
VISHWAS KUMAR PANDEY
VIBHU JINDAL
VISHWAS KUMAR PANDEY
Application Number:
JP2018153711A
Publication Date:
April 18, 2019
Filing Date:
August 17, 2018
Export Citation:
Assignee:
APPLIED MATERIALS INC
International Classes:
C23C14/34
Domestic Patent References:
| JP2017115211A | 2017-06-29 | |||
| JP2002220661A | 2002-08-09 | |||
| JP2001329362A | 2001-11-27 |
Foreign References:
| US20140061039A1 | 2014-03-06 | |||
| WO2005064036A1 | 2005-07-14 |
Attorney, Agent or Firm:
Sonoda/Kobayashi Patent Business Corporation