Title:
ETCHANT
Document Type and Number:
Japanese Patent JP2019176128
Kind Code:
A
Abstract:
To provide an etchant arranged so as to suppress the damage to IGZO.SOLUTION: An etchant comprises hydroxyethane diphosphonic acid, phosphonic acid, hydrogen peroxide, nitric acid, a fluorine compound, azole and alkaline. The phosphonic acid contains one or more kinds selected from a group consisting of diethylenetriamine pentamethylenephosphonic acid, N,N,N',N'-ethylenediaminetetrakis methylenephosphonic acid and aminotrimethylenephosphonic acid. The proportion of the hydroxyethane diphosphonic acid is in a range of 0.01-0.1 mass%. The proportion of the phosphonic acid is in a range of 0.003-0.04 mass%.SELECTED DRAWING: Figure 3
Inventors:
YAMADA YOZO
GOTO TOSHIYUKI
GOTO TOSHIYUKI
Application Number:
JP2018240569A
Publication Date:
October 10, 2019
Filing Date:
December 25, 2018
Export Citation:
Assignee:
MITSUBISHI GAS CHEMICAL CO
International Classes:
H01L21/308; H01L21/336; H01L29/786
Domestic Patent References:
| JPS58123878A | 1983-07-23 | |||
| JP2016108659A | 2016-06-20 | |||
| JP2016111342A | 2016-06-20 |
Foreign References:
| WO2017188108A1 | 2017-11-02 | |||
| CN103060805A | 2013-04-24 |
Attorney, Agent or Firm:
Hiroshi Kobayashi
Kyoei Sugiyama
Kyoko Tamura
Yasuhito Suzuki
Kyoei Sugiyama
Kyoko Tamura
Yasuhito Suzuki