Title:
NAIL POLISH COMPOSITION SYSTEM AND ITS APPLICATION METHOD
Document Type and Number:
Japanese Patent JP2020015714
Kind Code:
A
Abstract:
To reduce the drying time of a base coat nail polish composition and a top coat nail polish composition.SOLUTION: Provided is a nail polish composition system containing (a) a base coat nail polish composition containing an organic solvent, a film-forming compound, a plasticizer, and one or more additives, and (b) a topcoat nail polish composition containing a mixture of methacrylate and cyanoacrylates. The base coat nail polish composition is applied to a fingernail to form a base coat film. Thereafter, the top coat nail polish composition is applied above the base coat film to form a top coat film. According to such a nail polish composition system, the time required for drying the base coat nail polish composition and the top coat nail polish composition can be significantly reduced. In addition, the nail polish composition system can be applied without immersing the fingernails in a polish of powder.SELECTED DRAWING: None
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Inventors:
CHANG CHIN HAO
Application Number:
JP2019123674A
Publication Date:
January 30, 2020
Filing Date:
July 02, 2019
Export Citation:
Assignee:
GROOVE CO LTD
International Classes:
A61K8/41; A61K8/36; A61K8/40; A61K8/81; A61Q3/02; C09D4/02; C09D4/04; C09D7/63; C09D201/00
Attorney, Agent or Firm:
Yata Ryuichi
Kenichi Yoshitake
Kenichi Yoshitake