Title:
SALT, ACID GENERATOR, RESIST COMPOSITION AND PRODUCTION METHOD OF RESIST PATTERN
Document Type and Number:
Japanese Patent JP2020015715
Kind Code:
A
Abstract:
To provide a salt, an acid generator and a resist composition from which a resist pattern having good CD uniformity (CDU) can be produced.SOLUTION: The salt is represented by formula (I), and the acid generator and the resist composition contain the salt. In the formula, Qand Qeach represent a fluorine atom or a perfluoroalkyl group; Rand Reach represent a hydrogen atom, a fluorine atom or a perfluoroalkyl group; z represents an integer of 0 to 6; Xrepresents *-CO-O-, *-O-CO-, *-O-CO-O or *-O-; Lrepresents a single bond or a saturated hydrocarbon group; Arepresents a divalent alicyclic hydrocarbon group which may have a substituent; Rrepresents a fluorine atom or a fluorinated alkyl group; and Zrepresents an organic cation.SELECTED DRAWING: None
Inventors:
MASUYAMA TATSURO
YAMAMOTO SATOSHI
ICHIKAWA KOJI
YAMAMOTO SATOSHI
ICHIKAWA KOJI
Application Number:
JP2019126987A
Publication Date:
January 30, 2020
Filing Date:
July 08, 2019
Export Citation:
Assignee:
SUMITOMO CHEMICAL CO
International Classes:
C07C309/17; C07C381/12; C07D327/06; C07D333/46; C09K3/00; G03F7/004; G03F7/039; G03F7/20
Domestic Patent References:
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Foreign References:
| WO2016104565A1 | 2016-06-30 | |||
| WO2017135003A1 | 2017-08-10 |
Attorney, Agent or Firm:
Shinki Global IP Patent Corporation