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Title:
REMOVAL METHOD OF FINE PARTICLES IN WATER
Document Type and Number:
Japanese Patent JP2020025922
Kind Code:
A
Abstract:
To produce high quality fine particle removal water suitable for ultrapure water used in electronic component manufacturing processes and cleaning processes while suppressing an effect of functional groups introduced into an MF film or a UF film in ultrapure water production process, etc., when removing fine particles in water by the NF film or UF film having at least one functional group of a primary amino group, a secondary amino group, a tertiary amino group, and a quaternary ammonium group.SOLUTION: Prior to use for particle removal, an MF film or a UF film having at least one functional group of a primary amino group, a secondary amino group, a tertiary amino group, and a quaternary ammonium group, is washed with an alkaline agent having pH of 9 or more, and then used for removing fine particles.SELECTED DRAWING: Figure 1

Inventors:
FUJIMURA YU
OGAWA YUICHI
TANAKA YOICHI
KAWAKATSU TAKAHIRO
KANEDA MASAYUKI
MATSUMOTO MITSUAKI
Application Number:
JP2018151720A
Publication Date:
February 20, 2020
Filing Date:
August 10, 2018
Export Citation:
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Assignee:
KURITA WATER IND LTD
ASAHI KASEI CORP
International Classes:
C02F1/44; B01D61/14; B01D65/06; B01D71/82
Domestic Patent References:
JP2000317413A2000-11-21
JP2004122020A2004-04-22
Foreign References:
WO2016136650A12016-09-01
WO2008123351A12008-10-16
WO2002013981A12002-02-21
WO2017145419A12017-08-31
CN1408653A2003-04-09
Attorney, Agent or Firm:
Tsuyoshi Shigeno
Takayuki Shigeno