Title:
PHOTOSENSITIVE ACID GENERATORS AND PHOTORESISTS COMPRISING THE SAME
Document Type and Number:
Japanese Patent JP2020197729
Kind Code:
A
Abstract:
To provide: new photosensitive acid generator compounds (PAGs) that can be used in both positive and negative photoresist compositions; and photoresist compositions that comprise the compounds.SOLUTION: The invention relates to photosensitive acid generator compounds that generate an α,α-difluoroalkyl sulfonic acid upon exposure to radiation; positive and negative chemically amplified resists that contain such PAGs; and methods for synthesis of such PAGs and α,α-difluoroalkyl sulfonic acids.SELECTED DRAWING: None
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Inventors:
JAMES F CAMERON
ZYDOWSKY THOMAS M
ZYDOWSKY THOMAS M
Application Number:
JP2020129030A
Publication Date:
December 10, 2020
Filing Date:
July 30, 2020
Export Citation:
Assignee:
ROHM & HAAS ELECT MAT
International Classes:
G03F7/004; C07B61/00; C07C17/263; C07C22/08; C07C303/20; C07C303/32; C07C309/24; C07C381/12; C09K3/00; G03F7/038; G03F7/039; G03F7/20; H01L21/027
Domestic Patent References:
JP2000147753A | 2000-05-26 | |||
JP2002131897A | 2002-05-09 | |||
JP2002139838A | 2002-05-17 |
Foreign References:
WO2000008525A1 | 2000-02-17 |
Attorney, Agent or Firm:
Takuro Saeki
Nakamura Tadashi Exhibition
Yuko Saeki
Nakamura Tadashi Exhibition
Yuko Saeki