Title:
PHOTOMASK
Document Type and Number:
Japanese Patent JP2021110770
Kind Code:
A
Abstract:
To provide a photomask which can stably resolve a fine hole pattern.SOLUTION: A photomask includes a transmission part for exposing a transmitting substrate, and a first phase shift part and a second phase shift part which invert a phase of exposure light so as to surround the transmission part. The second phase shift part is interposed between the first phase shift part and the transmission part, and transmittance of the second phase shift part to the exposure light is lower than transmittance of the first phase shift part thereto. The second phase shift part can be composed of a laminate structure of a phase shift film of the first phase shift part and a semi-transmitting film.SELECTED DRAWING: Figure 1
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Inventors:
TANAKA CHIE
YAMADA AYUMI
SAITO TAKASHI
YAMADA AYUMI
SAITO TAKASHI
Application Number:
JP2020000749A
Publication Date:
August 02, 2021
Filing Date:
January 07, 2020
Export Citation:
Assignee:
SK ELECTRONICS CO LTD
International Classes:
G03F1/32; C23C14/06; G03F1/58
Attorney, Agent or Firm:
Moriwaki Patent Office