Title:
SPUTTERING TARGET AND MANUFACTURING METHOD OF THE SAME
Document Type and Number:
Japanese Patent JP2021127480
Kind Code:
A
Abstract:
To provide an organic/inorganic composite sputtering target capable of stably depositing an organic/inorganic hybrid film by sputtering, and a manufacturing method of the sputtering target.SOLUTION: Provided is a sputtering target including a metal oxide matrix, a fluororesin component in the matrix, and a resin binder. Also provided is a manufacturing method of the sputtering target including the steps of: mixing a fluororesin powder, a metal oxide powder and a resin binder to obtain a mixture; forming to obtain a molding by compression-molding the mixture; and sintering the molding at 100°C or more and 200°C or less to obtain a sintered body.SELECTED DRAWING: Figure 1
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Inventors:
TAGA YASUNORI
Application Number:
JP2020021735A
Publication Date:
September 02, 2021
Filing Date:
February 12, 2020
Export Citation:
Assignee:
GEOMATEC CO LTD
TOYOSHIMA SEISAKUSHO KK
HYOMEN KAIMEN KOBO CORP
TOYOSHIMA SEISAKUSHO KK
HYOMEN KAIMEN KOBO CORP
International Classes:
C23C14/34; C04B35/50
Attorney, Agent or Firm:
Atsushi Akiyama
Fukushi Chieko
Kakubuchi Yuei
Fukushi Chieko
Kakubuchi Yuei