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Title:
投影マイクロリソグラフィ装置の照明手段
Document Type and Number:
Japanese Patent JP4169374
Kind Code:
B2
Abstract:
The illumination source uses a laser (1) and an objective (2), with respective diffractive optical rasters (8,9), with a 2-dimensional raster structure, positioned in the exit pupil and object plane of the objective. Pref. the first raster (9) is used to convert the rectangular divergence distribution of the lase beam into a circular, annular or quadrupole output divergence distribution, the second raster (8) providing a direction-dependent divergence.

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Inventors:
Johannes Wangler
Gerhard Itner
Application Number:
JP15916596A
Publication Date:
October 22, 2008
Filing Date:
May 31, 1996
Export Citation:
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Assignee:
Carl Zeiss SMT AG
International Classes:
G03F7/20; H01L21/027
Domestic Patent References:
JP737773A
JP6118657A
JP645217A
JP5283317A
JP566357A
JP248627A
JP1191801A
JP6481222A
JP6366553A
JP63187229A
JP6266218A
Attorney, Agent or Firm:
Masaki Yamakawa



 
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