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Title:
光起電力装置
Document Type and Number:
Japanese Patent JP4194379
Kind Code:
B2
Abstract:

To provide a photovoltaic device capable of producing a high open voltage and a high output.

The photovoltaic device is provided with an n-type single crystal silicon substrate 1 which has surface and rear surface and in which light is made incident from the surface side, a substantially intrinsic nondoped amorphous silicon layer 2 formed on the surface of the n-type single crystal silicon substrate 1, a p-type amorphous silicon layer 3 formed on the surface of the nondoped amorphous silicon layer 2, a transparent conductive film 4 formed on the p-type amorphous silicon layer 3, and a substantially intrinsic nondoped amorphous silicon layer 6 formed on the rear surface of the n-type single crystal silicon substrate 1 at least in a region corresponding to the region where the transparent conductive film 4 is formed.

COPYRIGHT: (C)2004,JPO&NCIPI


Inventors:
Maruyama Eiji
Application Number:
JP2003013292A
Publication Date:
December 10, 2008
Filing Date:
January 22, 2003
Export Citation:
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Assignee:
Sanyo Electric Co., Ltd.
International Classes:
H01L21/205; H01L31/04
Domestic Patent References:
JP9129904A
JP2002076397A
Attorney, Agent or Firm:
Hirokazu Miyazono