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Title:
イオン源
Document Type and Number:
Japanese Patent JP4446019
Kind Code:
B2
More Like This:
WO/1997/030465LOADLOCK ASSEMBLY FOR AN ION IMPLANTATION SYSTEM
JP4013081Control mechanism for controlling dose amount measurement in ion implanter
Inventors:
Yasuyuki Tsuji
Application Number:
JP2009523504A
Publication Date:
April 07, 2010
Filing Date:
March 23, 2009
Export Citation:
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Assignee:
Mitsui Shipbuilding Co., Ltd.
International Classes:
H01J27/14
Domestic Patent References:
JPH08264143A1996-10-11
JPH08212953A1996-08-20
JPH05182623A1993-07-23
JP2007311118A2007-11-29
JP2006216440A2006-08-17
JP2001023532A2001-01-26
Attorney, Agent or Firm:
Global IP Tokyo Patent Business Corporation



 
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